INTERFACE CHARACTERISTICS OF OXIDE SEMICONDUCTOR ON SILICON HETEROJUNCTIONS

被引:0
|
作者
KAR, S
GOBIS, L
DUBOW, J
机构
[1] INDIAN INST TECHNOL,DEPT ELECT ENGN,KANPUR 208016,UTTAR PRADESH,INDIA
[2] COLORADO STATE UNIV,DEPT ELECT ENGN,FT COLLINS,CO 80523
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D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:C370 / C370
页数:1
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