QUANTITATIVE-DETERMINATION OF OXYGEN IN THIN OXIDE-FILMS ON METALS BY ELECTRON-EXCITED X-RAY-EMISSION

被引：29

作者：

MITCHELL, DF ^{[1
]}

SEWELL, PB ^{[1
]}

机构：

[1] NATL RES COUNCIL CANADA,DIV CHEM,OTTAWA,ONTARIO,CANADA

来源：

THIN SOLID FILMS | 1974年 / 23卷 / 01期

关键词：

D O I：

10.1016/0040-6090(74)90221-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：109 / 125

页数：17

共 29 条

[1]

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[3]

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[4]

COSSLETT VE, 1960, XRAY MICROSCOPY XRAY

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[6] A RADIOCHEMICAL TECHNIQUE FOR STUDYING RANGE-ENERGY RELATIONSHIPS FOR HEAVY IONS OF KEV ENERGIES IN ALUMINUM [J].

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[7] RANGES OF HEAVY IONS IN AMORPHOUS OXIDES [J].

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MCCARGO, M .

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[8]

DUNCUMB P, 1966, P S ELECTRON MICROPR, P284

[9] MECHANISM OF LOW-TEMPERATURE OXIDATION (23 DEGREES 450 DEGREES C) OF POLYCRYSTALLINE NICKEL [J].

GRAHAM, MJ ;

COHEN, M .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (07) :879-&

[10] INFLUENCE OF OXIDE STRUCTURE ON OXIDATION RATE OF NICKEL SINGLE-CRYSTALS [J].

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