IN-SITU FTIR EMISSION-SPECTROSCOPY IN A TECHNOLOGICAL ENVIRONMENT - CHEMICAL-VAPOR INFILTRATION (CVI) OF SIC COMPOSITES

被引:33
作者
HOPFE, V
MOSEBACH, H
ERHARD, M
MEYER, M
机构
[1] KAYSER THREDE GMBH,D-81379 MUNICH,GERMANY
[2] DAIMLER BENZ AG,ZENT WERKSTOFFLAB,D-81663 MUNICH,GERMANY
关键词
D O I
10.1016/0022-2860(95)08555-A
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A method has been established to detect transient species inside a hot wall technological reactor. The CVI plant is used to produce fibre reinforced composite materials with ceramic matrix, in particular to infiltrate carbon fibre woven structures with SiC. The infiltration has been carried out at about 1000 degrees C under reduced pressure with a mixture of CH3SiCl3 (methyltrichlorosilane, MTS) and H-2 as the SiC precursor. To investigate the gas reactions near the preform the emissivity has been measured by FTIR spectrometry. Several gaseous species could be detected including MTS, SiCl2, (SiCl3)(n=1,2), SiCl4, HSiCl3, CH4, CH3Cl and HCl, also possible indications for CH3 radicals and SiC clusters have been found. The interpretation of the multicomponent high temperature emission spectra has been supported by investigating reference spectra of individual components at working temperature. Band profile changes caused by both temperature and precursor decay have been detected. After radiation calibration, concentration changes and the degree of MTS decay could be roughly estimated. The spectroscopical results are evaluated in comparison with kinetic models of the MTS decay.
引用
收藏
页码:331 / 342
页数:12
相关论文
共 22 条
[1]   THEORETICAL-STUDY OF THE THERMOCHEMISTRY OF MOLECULES IN THE SI-C-CL-H SYSTEM [J].
ALLENDORF, MD ;
MELIUS, CF .
JOURNAL OF PHYSICAL CHEMISTRY, 1993, 97 (03) :720-728
[2]   INSITU, REAL-TIME DIAGNOSTICS OF OMVPE USING IR-DIODE LASER SPECTROSCOPY [J].
BUTLER, JE ;
BOTTKA, N ;
SILLMON, RS ;
GASKILL, DK .
JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) :163-171
[3]   DETECTION OF DRY ETCHING PRODUCT SPECIES WITH INSITU FOURIER-TRANSFORM INFRARED-SPECTROSCOPY [J].
CLELAND, TA ;
HESS, DW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (01) :35-40
[4]   INFRARED SPECTROSCOPIC DETERMINATION OF METHYL-CHLOROSILANES FROM THE DIRECT PROCESS REACTION [J].
FRIEDRICH, HB ;
SEVENICH, DM ;
GASPERGALVIN, LD ;
RETHWISCH, DG .
ANALYTICA CHIMICA ACTA, 1989, 222 (02) :221-234
[5]  
HANABUSA M, 1984, SPRINGER SERIES CHEM, V39, P197
[6]  
HANABUSA M, 1983, JPN J APPL PHYS, V22, P11
[7]   PHOTOFRAGMENT INFRARED-EMISSION SPECTROSCOPY - VIBRATIONAL PROGRESSION AND POTENTIAL PARAMETERS OF THE CH3(NU-2) UMBRELLA MODE [J].
HERMANN, HW ;
LEONE, SR .
JOURNAL OF CHEMICAL PHYSICS, 1982, 76 (10) :4759-4765
[8]   OBSERVATION OF HSICL IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE [J].
HO, P ;
BREILAND, WG .
APPLIED PHYSICS LETTERS, 1983, 43 (01) :125-126
[9]   INSITU FTIR EMISSION-SPECTROSCOPY ON CHEMICAL VAPOR-DEPOSITION PROCESSES [J].
HOPFE, V ;
WAGNER, D ;
KLOBES, P ;
HERZIG, S ;
MARX, G .
JOURNAL OF MOLECULAR STRUCTURE, 1990, 217 :115-130
[10]   INFRARED REFLECTION STUDIES OF CERAMICS - CHARACTERIZATION OF SIC LAYERS ON GRAPHITE SUBSTRATES [J].
HOPFE, V ;
GRAHLERT, W ;
BRENNFLECK, K ;
KORTE, EH ;
THEISS, W .
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1993, 346 (1-3) :99-103