ELECTRIC PROPERTIES OF METAL DIAMOND INTERFACES UTILIZING HYDROGEN-TERMINATED SURFACES OF HOMOEPITAXIAL DIAMONDS

被引:44
作者
AOKI, M
KAWARADA, H
机构
[1] School of Science and Engineering, Waseda University, Shinjuku-ku, Tokyo, 169
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 5B期
关键词
CVD DIAMOND; AS-GROWN SURFACE; HYDROGEN TERMINATION; 2X1; RECONSTRUCTION; SURFACE STATE; SCHOTTKY BARRIER HEIGHT; ELECTRONEGATIVITY;
D O I
10.1143/JJAP.33.L708
中图分类号
O59 [应用物理学];
学科分类号
摘要
As-grown homoepitaxial diamond surfaces fabricated by chemical vapor deposition are terminated by hydrogen, and are expected to have a low density of surface states. On such diamond surfaces, high-quality Schottky contacts have been obtained utilizing metals with low electronegativities, such as Al or Pb. The ideality factors of those point contacts to diamond are less than 1.1, which is the nearest value to unity ever reported in diamonds. Quantitative measurements of Schottky barrier heights at various metal contacts have also been performed. A strong correlation between the barrier heights and the metal electronegativities is observed. Even an ohmic property is obtained when metals with higher electronegativities were used. The eff ect of Fermi level pinning is reduced at the interfaces between metals and hydrogen-terminated diamonds.
引用
收藏
页码:L708 / L711
页数:4
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