ZIRCONIUM SILICON-OXIDE FILMS FOR DURABLE SOLAR CONTROL COATINGS

被引:10
作者
ANDO, E
EBISAWA, J
HAYASHI, Y
MITSUI, A
SUZUKI, S
机构
[1] R and D Center, Asahi Glass Co., Ltd., Kanagawa-ku, Yokohama, 221
关键词
Direct current reactive magnetron sputtering - Zirconium silicon oxide films;
D O I
10.1016/0022-3093(94)90291-7
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Zirconium silicon oxide films were deposited by de reactive magnetron sputtering of Zr-Si alloy targets. The character and durability of these films were investigated. Thin film X-ray diffraction analyis showed that the film structure changed from crystalline to amorphous with an abrupt decrease of internal stress for an SiO2 content of more than 20 mol%. Reduction of friction due to the amorphous structure was related to an improved mechanical durability. Films with an SiO2 content of 30-90 mol% were favorable as a durable protection layer. Taber abrasion of a double-layer system (amorphous Zr-Si oxide/TiNx/glass) indicated that not only the reduction of friction but also the oxide thickness was a key factor for the improved mechanical resistance.
引用
收藏
页码:238 / 244
页数:7
相关论文
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