NITRIDATION REACTION OF TANTALUM PENTACHLORIDE IN THE PRESENCE OF MAGNESIUM

被引:0
|
作者
MORI, T [1 ]
TOKUNAGA, M [1 ]
EGUCHI, K [1 ]
KOBAYASHI, H [1 ]
MITAMURA, T [1 ]
机构
[1] MONSANTO JAPAN LTD,CHIYODA KU,TOKYO 100,JAPAN
来源
DENKI KAGAKU | 1992年 / 60卷 / 04期
关键词
TANTALUM NITRIDE; TANTALUM PENTACHLORIDE; MG; HALOGENIDE PROCESS;
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The nitridation process of TaCl5 with Mg (2:5 in molar ratio) has been investigated at 200-degrees approximately 1050-degrees-C under a nitrogen gas flow. The tantalum nitrides of beta-, gamma-, theta- and epsilon- phases were synthesized according to their temperatures by the diffusion and occlusion of nitrogen in Ta lattices, after metallic Ta was formed by the reduction of TaCl5 with Mg above 400-degrees-C. In the reduction-nitridation of the TaCl5-Mg-N2 system, the formation reactions such as TaCl5 --> metallic Ta --> TaN0.1 (beta-phase) --> Ta2N (gamma-phase) --> TaN0.8 (theta-phase) --> TaN1.0 (epsilon-phase) proceeded stepwise accompanying a phase transition with increasing temperature. The phases of tantalum nitrides had the most stable structure at each temperature:TaN0.1, Ta2N and TaN0.8 were formed at 400-degrees-C, 600-degrees-C and 800-degrees-C, respectively.
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页码:322 / 326
页数:5
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