PLASMA SUPPLY TO EXTRACTION REGION IN HIGH-CURRENT ION-SOURCE

被引：0
|
作者：
NAITO, M [1 ]
AKIMUNE, H [1 ]
机构：
[1] KYOTO UNIV,PLASMA PHYS LAB,UJI,KYOTO 611,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1979年 / 18卷 / 11期
关键词：
D O I：
10.1143/JJAP.18.2127
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2127 / 2132
页数：6
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