CHARACTERIZATION OF P-TYPE GAAS HEAVILY DOPED WITH CARBON GROWN BY METALORGANIC MOLECULAR-BEAM EPITAXY

被引:142
作者
SAITO, K
TOKUMITSU, E
AKATSUKA, T
MIYAUCHI, M
YAMADA, T
KONAGAI, M
TAKAHASHI, K
机构
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D O I
10.1063/1.341356
中图分类号
O59 [应用物理学];
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页码:3975 / 3979
页数:5
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共 13 条
[1]   INFLUENCE OF GROWTH TEMPERATURE ON BE INCORPORATION IN MOLECULAR-BEAM EPITAXY GAAS EPILAYERS [J].
DUHAMEL, N ;
HENOC, P ;
ALEXANDRE, F ;
RAO, EVK .
APPLIED PHYSICS LETTERS, 1981, 39 (01) :49-51
[2]   ANOMALOUS REDISTRIBUTION OF BERYLLIUM IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
ENQUIST, P ;
WICKS, GW ;
EASTMAN, LF ;
HITZMAN, C .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) :4130-4134
[3]  
Hovel N., 1975, SEMICONDUCT SEMIMET, V11, P24
[4]   BERYLLIUM DOPING AND DIFFUSION IN MOLECULAR-BEAM EPITAXY OF GAAS AND ALXGA1-XAS [J].
ILEGEMS, M .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (03) :1278-1287
[5]   ABRUPT P-TYPE DOPING PROFILE OF CARBON ATOMIC LAYER DOPED GAAS GROWN BY FLOW-RATE MODULATION EPITAXY [J].
KOBAYASHI, N ;
MAKIMOTO, T ;
HORIKOSHI, Y .
APPLIED PHYSICS LETTERS, 1987, 50 (20) :1435-1437
[6]   ULTRAHIGH DOPING LEVELS OF GAAS WITH BERYLLIUM BY MOLECULAR-BEAM EPITAXY [J].
LIEVIN, JL ;
ALEXANDRE, F .
ELECTRONICS LETTERS, 1985, 21 (10) :413-414
[7]  
LIEVIN JL, 1985, I PHYS C SER, V79, P595
[8]   ANNEALING STUDIES OF BE-DOPED GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
MCLEVIGE, WV ;
VAIDYANATHAN, KV ;
STREETMAN, BG ;
ILEGEMS, M ;
COMAS, J ;
PLEW, L .
APPLIED PHYSICS LETTERS, 1978, 33 (02) :127-129
[9]   SURFACE EFFECT-INDUCED FAST BE DIFFUSION IN HEAVILY DOPED GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
PAO, YC ;
HIERL, T ;
COOPER, T .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (01) :201-204
[10]   THE USE OF SI AND BE IMPURITIES FOR NOVEL PERIODIC DOPING STRUCTURES IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
PLOOG, K ;
FISCHER, A ;
KUNZEL, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (02) :400-410