2-STEP PHOTOCONDUCTIVITY BY DISLOCATIONS IN SILICON

被引:12
作者
KOS, HJ [1 ]
NEUBERT, D [1 ]
机构
[1] INST BERLIN,PHYS TECH BUNDESANSTALT,BERLIN,FED REP GER
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1977年 / 44卷 / 01期
关键词
D O I
10.1002/pssa.2210440127
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:259 / 264
页数:6
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