GLOW-DISCHARGE PREPARATION OF HYDROGENATED AMORPHOUS-SILICON FROM DISILANE AND HIGHER SILANES

被引：0

作者：

SCOTT, BA ^{[1
]}

BRODSKY, MH ^{[1
]}

KIRBY, PB ^{[1
]}

PLECENIK, RM ^{[1
]}

GREEN, DC ^{[1
]}

SIMONYI, EE ^{[1
]}

KUCZA, J ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1980年 / 25卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：294 / 294

页数：1

共 50 条

[1] GLOW-DISCHARGE PREPARATION OF AMORPHOUS HYDROGENATED SILICON FROM HIGHER SILANES
SCOTT, BA
BRODSKY, MH
GREEN, DC
KIRBY, PB
PLECENIK, RM
SIMONYI, EE
APPLIED PHYSICS LETTERS, 1980, 37 (08) : 725 - 727
[2] THE GROWTH OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON
BHAT, PK
CHATHAM, H
SHING, YH
PERRY, JW
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 97-8 : 1383 - 1386
[3] OPTICAL AND ELECTRICAL-PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON PREPARED BY GLOW-DISCHARGE DECOMPOSITION OF DISILANE
SAKATA, I
YAMANAKA, M
MORI, Y
HAYASHI, Y
SOLAR ENERGY MATERIALS, 1984, 10 (02): : 121 - 138
[4] THE NUCLEATION AND GROWTH OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON
COLLINS, RW
PAWLOWSKI, A
JOURNAL OF APPLIED PHYSICS, 1986, 59 (04) : 1160 - 1166
[5] PLASMA SPECTROSCOPY GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
MATSUDA, A
TANAKA, K
THIN SOLID FILMS, 1982, 92 (1-2) : 171 - 187
[6] PREPARATION OF GLOW-DISCHARGE AMORPHOUS-SILICON FOR PASSIVATION LAYERS
WEITZEL, I
PRIMIG, R
KEMPTER, K
THIN SOLID FILMS, 1981, 75 (02) : 143 - 150
[7] MECHANISMS INVOLVED IN THE GLOW-DISCHARGE DEPOSITION OF DOPED HYDROGENATED AMORPHOUS-SILICON
KAMPAS, FJ
VANIER, PE
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1984, 66 (1-2) : 25 - 29
[8] MECHANISM OF PHOTOLUMINESCENCE IN HYDROGENATED AND CHLORINATED AMORPHOUS-SILICON PREPARED BY GLOW-DISCHARGE
ALDALLAL, S
JOURNAL OF LUMINESCENCE, 1984, 31-2 (DEC) : 406 - 408
[9] THE EFFICIENCY OF GAS USAGE IN GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
SMITH, GJ
MILNE, WI
SOLAR ENERGY MATERIALS, 1984, 9 (04): : 459 - 470
[10] GAS-PHASE FREE-RADICAL REACTIONS IN THE GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FROM SILANE AND DISILANE
KAMPAS, FJ
JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) : 2290 - 2291

← 1 2 3 4 5 →