DEFECT DENSITY VARIATION WITH DEPOSITION RATE IN SNSB THIN-FILMS FROM ANNEALING STUDY OF ELECTRICAL-RESISTANCE

被引：0

作者：

DAS, VD ^{[1
]}

JAGADEESH, MS ^{[1
]}

机构：

[1] INDIAN INST TECHNOL,DEPT PHYS,THIN FILM LAB,MADRAS 600036,INDIA

来源：

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 1977年 / 38卷 / 02期

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中图分类号：

O6 [化学];

学科分类号：

0703 ;

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页码：167 / 174

页数：8

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