STUDY OF FILMS HAVING BASE OF TIN OXIDE AND INDIUM OXIDE BY MEANS OF X-RAY-DIFFRACTION

被引：40

作者：

HECQ, M ^{[1
]}

DUBOIS, A ^{[1
]}

VANCAKEN.J ^{[1
]}

机构：

[1] UNIV ETAT MONS,LAB CHIM INORG,7000 MONS,BELGIUM

来源：

THIN SOLID FILMS | 1973年 / 18卷 / 01期

关键词：

D O I：

10.1016/0040-6090(73)90229-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：117 / 125

页数：9

共 14 条

[1]

BAUER E, 1964, SINGLE CRYSTAL FIMS

[2] STRUCTURE OF INDIUM OXIDE TIN OXIDE TRANSPARENT CONDUCTING FILMS BY ELECTRON-DIFFRACTION AND ELECTRON SPECTROSCOPY [J].

BOSNELL, JR ;

WAGHORNE, R .

THIN SOLID FILMS, 1973, 15 (02) :141-148

[3] HIGHLY CONDUCTIVE, TRANSPARENT FILMS OF SPUTTERED IN2-XSNXO3-Y [J].

FRASER, DB ;

COOK, HD .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (10) :1368-&

[4]

GILLEPSIE FH, 1972, INFORMATION DISPLAY

[5]

GORDON F, 1956, HDB PHYSIK, V22

[6] PLASMA SOURCE FOR PRODUCTION OF THIN OXIDE-FILMS [J].

HECQ, M ;

VANCAKEN.J .

THIN SOLID FILMS, 1972, 12 (02) :453-&

[7] CHEMICAL VIEWS ON FORMATION OF TIN OXIDE-FILMS BY REACTIVE SPUTTERING [J].

HECQ, M ;

PORTIER, E .

THIN SOLID FILMS, 1972, 9 (03) :341-&

[8] LIQUID-CRYSTAL DISPLAY DEVICES [J].

HEILMEIER, GH .

SCIENTIFIC AMERICAN, 1970, 222 (04) :100-+

[9] ELECTRICAL AND OPTICAL PROPERTIES OF SPUTTERED IN2O3 FILMS .I. ELECTRICAL PROPERTIES AND INTRINSIC ABSORPTION [J].

MULLER, HK .

PHYSICA STATUS SOLIDI, 1968, 27 (02) :723-&

[10]

SNELLING JB, 1971, SCRR710048 SCAND LAB

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