DISLOCATION DIPOLES IN STRAINED INGAAS LAYERS GROWN ON GAAS

被引:0
作者
KIGHTLEY, P [1 ]
ARAGONHERRANZ, G [1 ]
GOODHEW, PJ [1 ]
POND, RC [1 ]
机构
[1] UNIV CADIZ,DEPT QUIM INORGAN,CADIZ,SPAIN
来源
INSTITUTE OF PHYSICS CONFERENCE SERIES | 1991年 / 117期
关键词
MISFIT DISLOCATIONS;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Dipole formation at the interfaces of InGaAs/GaAs multilayers has been studied. Slip dipoles with sides along <110> are demonstrated and their use to reduce residual threading dislocation density for strained layer materials is shown. A detailed diffraction contrast analysis has been performed upon dipoles that have <010> line directions. These dipoles also relieve misfit and probably arise from a climb process.
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页码:603 / 606
页数:4
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