APPLICATION OF ION MICROPROBE ANALYZER TO MEASUREMENT OF DISTRIBUTION OF BORON IONS IMPLANTED INTO SILICON CRYSTALS

被引：40
作者：
GITTINS, RP
DEARNALEY, G
MORGAN, DV
机构：
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1972年 / 5卷 / 09期
关键词：
D O I：
10.1088/0022-3727/5/9/321
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：1654 / +
页数：1
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