SPUTTERING YIELDS FOR NORMALLY INCIDENT HG+-ION BOMBARDMENT AT LOW ION ENERGY

被引：95
作者：
WEHNER, GK
机构：
来源：
PHYSICAL REVIEW | 1957年 / 108卷 / 01期
关键词：
D O I：
10.1103/PhysRev.108.35
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
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页码：35 / 45
页数：11
相关论文
共 23 条
[1]   SPUTTERING OF ALKALI ATOMS BY INERT GAS IONS OF LOW ENERGY [J].
BRADLEY, RC .
PHYSICAL REVIEW, 1954, 93 (04) :719-728
[2]   The deposition of sputtered films [J].
Ditchburn, RW .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-CONTAINING PAPERS OF A MATHEMATICAL AND PHYSICAL CHARACTER, 1933, 141 (843) :169-188
[3]  
ENGEL AV, 1932, ELEKTRISCHE GASESTLA, V1, P37
[4]  
Fetz H, 1940, ANN PHYS-BERLIN, V37, P1
[5]   About the Sputtering at oblique Collision of the Ions [J].
Fetz, H. .
ZEITSCHRIFT FUR PHYSIK, 1942, 119 (9-10) :590-601
[6]  
GUENTHERSCHULZE A, 1926, ANN PHYSIK, V36, P563
[7]   ELECTRON EJECTION FROM MO BY HE+, HE++, AND HE-2(+) [J].
HAGSTRUM, HD .
PHYSICAL REVIEW, 1953, 89 (01) :244-255
[8]   THEORY OF AUGER EJECTION OF ELECTRONS FROM METALS BY IONS [J].
HAGSTRUM, HD .
PHYSICAL REVIEW, 1954, 96 (02) :336-365
[9]   AUGER EJECTION OF ELECTRONS FROM TUNGSTEN BY NOBLE GAS IONS [J].
HAGSTRUM, HD .
PHYSICAL REVIEW, 1954, 96 (02) :325-335
[10]  
Holland L., 1953, VACUUM, V3, P245
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