EPITAXIAL-GROWTH OF HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS

被引：20

作者：

ECKSTEIN, JN

SCHLOM, DG

HELLMAN, ES

VONDESSONNECK, KE

CHEN, ZJ

WEBB, C

TURNER, F

HARRIS, JS

BEASLEY, MR

GEBALLE, TH

机构：

[1] STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305

[2] STANFORD UNIV,DEPT APPL PHYS,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 02期

关键词：

D O I：

10.1116/1.584741

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：319 / 323

页数：5

共 19 条

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