ANGULAR DISTRIBUTION OF SPUTTERED MATERIAL

被引：185

作者：

WEHNER, GK

ROSENBERG, D

机构：

来源：

关键词：

D O I：

10.1063/1.1735395

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：177 / 179

页数：3

共 8 条

[1]

Blechschmidt E, 1928, ANN PHYS-BERLIN, V86, P1006

[2] Remarks of the Theory of sputtering [J].

Seeliger, R. ;

Sommermeyer, K. .

ZEITSCHRIFT FUR PHYSIK, 1935, 93 (9-10) :692-695

[3]

von Hippel A, 1926, ANN PHYS-BERLIN, V81, P1043

[4]

WEHNER G, 1959, J APPL PHYS OCT

[5] CONTROLLED SPUTTERING OF METALS BY LOW-ENERGY HG IONS [J].

WEHNER, GK .

PHYSICAL REVIEW, 1956, 102 (03) :690-704

[6] SPUTTERING OF METAL SINGLE CRYSTALS BY ION BOMBARDMENT [J].

WEHNER, GK .

WEHNER, GK .

PHYSICAL REVIEW, 1957, 108 (01) :35-45

[8] MOMENTUM TRANSFER IN SPUTTERING BY ION BOMBARDMENT [J].

WEHNER, GK .