REACTIVE ION-BEAM ETCHING OF POLYIMIDE THIN-FILMS

被引：41

作者：

VANDERLINDE, WE ^{[1
]}

RUOFF, AL ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584420

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1621 / 1625

页数：5

共 14 条

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[2]

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[6] SIMULATION OF PLASMA-ASSISTED ETCHING PROCESSES BY ION-BEAM TECHNIQUES [J].

MAYER, TM ;

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[7]

RANGELOW IW, 1981, MICROELECTRON ENG, V3, P475

[8]

SAIKI A, 1984, POLYIMIDES, V2, P827

[9]

SAMUELSON G, 1984, POLYIMIDES SYNTHESIS, P751

[10] MECHANISMS AND THEORY OF PHYSICAL SPUTTERING BY PARTICLE IMPACT [J].

SIGMUND, P .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 27 (01) :1-20

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