ELECTRICAL CHARACTERISTICS OF TI/SI(100) INTERFACES

被引：42
作者：
ABOELFOTOH, MO [1 ]
机构：
[1] ROYAL INST TECHNOL,DEPT SOLID STATE ELECTR,S-10044 STOCKHOLM 70,SWEDEN
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 08期
关键词：
D O I：
10.1063/1.341338
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4046 / 4055
页数：10
相关论文
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