STRUCTURAL AND ELECTRONIC-PROPERTIES OF CVD SILICON FILMS NEAR THE CRYSTALLIZATION TEMPERATURE

[1] Barna A., 1972, J NONCRYSTALL SOLIDS, V8-10, P36, DOI DOI 10.1016/0022-3093(72)90114-7

[2] TEMPERATURE-DEPENDENCE OF THE GROWTH-RATE OF SILICON PREPARED THROUGH CHEMICAL VAPOR-DEPOSITION FROM SILANE [J]. APPLIED PHYSICS LETTERS, 1982, 41 (02) : 153 - 155

[3] BLOEM J, 1978, CURRENT TOPICS MATER, V1, P147

[4] BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556

[5] CULLITY BD, 1956, ELEMENTS XRAY DIFFRA, P270

[6] SOME OBSERVATIONS ON THE AMORPHOUS TO CRYSTALLINE TRANSFORMATION IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) : 397 - 403

[7] ELECTRONIC PROPERTIES OF CHEMICALLY DEPOSITED POLYCRYSTALLINE SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (01) : 377 - 382

[8] OPTICAL-PROPERTIES AND STRUCTURE OF AMORPHOUS SILICON FILMS PREPARED BY CVD [J]. SOLAR ENERGY MATERIALS, 1979, 1 (1-2): : 11 - 27

[9] STRUCTURE OF CHEMICALLY DEPOSITED POLYCRYSTALLINE-SILICON FILMS [J]. THIN SOLID FILMS, 1973, 16 (02) : 147 - 165

[10] ELECTRON SPIN RESONANCE IN PHOSPHORUS DOPED SILICON AT LOW TEMPERATURES [J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1965, 20 (08) : 1447 - &

[1] Barna A., 1972, J NONCRYSTALL SOLIDS, V8-10, P36, DOI DOI 10.1016/0022-3093(72)90114-7

[2] TEMPERATURE-DEPENDENCE OF THE GROWTH-RATE OF SILICON PREPARED THROUGH CHEMICAL VAPOR-DEPOSITION FROM SILANE [J]. APPLIED PHYSICS LETTERS, 1982, 41 (02) : 153 - 155

[3] BLOEM J, 1978, CURRENT TOPICS MATER, V1, P147

[4] BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556

[5] CULLITY BD, 1956, ELEMENTS XRAY DIFFRA, P270

[6] SOME OBSERVATIONS ON THE AMORPHOUS TO CRYSTALLINE TRANSFORMATION IN SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) : 397 - 403

[7] ELECTRONIC PROPERTIES OF CHEMICALLY DEPOSITED POLYCRYSTALLINE SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (01) : 377 - 382

[8] OPTICAL-PROPERTIES AND STRUCTURE OF AMORPHOUS SILICON FILMS PREPARED BY CVD [J]. SOLAR ENERGY MATERIALS, 1979, 1 (1-2): : 11 - 27

[9] STRUCTURE OF CHEMICALLY DEPOSITED POLYCRYSTALLINE-SILICON FILMS [J]. THIN SOLID FILMS, 1973, 16 (02) : 147 - 165

[10] ELECTRON SPIN RESONANCE IN PHOSPHORUS DOPED SILICON AT LOW TEMPERATURES [J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1965, 20 (08) : 1447 - &