STUDY OF MICROSTRUCTURE AND ANOMALOUS VARIATION OF RESISTIVITY IN METAL-C-60 MULTILAYER THIN-FILMS

被引：11

作者：

ZHAO, WB ^{[1
]}

LUO, KJ ^{[1
]}

CHEN, J ^{[1
]}

ZHANG, JL ^{[1
]}

LI, CY ^{[1
]}

YIN, DL ^{[1
]}

GU, ZN ^{[1
]}

ZHOU, XH ^{[1
]}

JIN, ZX ^{[1
]}

机构：

[1] BEIJING UNIV,DEPT CHEM,BEIJING 100871,PEOPLES R CHINA

来源：

SOLID STATE COMMUNICATIONS | 1992年 / 83卷 / 11期

关键词：

D O I：

10.1016/0038-1098(92)90899-K

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The structure and electrical transport properties of C60 thin films and some metal-C60 multilayer thin films were studied. We find the resistance decreases sharply when adding C60 on some specific metal layers. There are two possible explainations: one is the formation of a conduction layer of metal doped C60, the other is the bonding interfacial interaction between the metal and C60 layers, which may result a better continuous metal layer.

引用

页码：853 / 855

页数：3

共 11 条

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