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- [2] MATERIALS CHARACTERIZATION BY AUGER-ELECTRON SPECTROSCOPY AND SECONDARY ION MASS-SPECTROMETRY ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1974, : 81 - 81
- [4] SENSITIVITY LIMITATIONS IN THE ANALYSIS OF SEMICONDUCTOR-DEVICES WITH AUGER-ELECTRON SPECTROMETRY (AES) AND SECONDARY ION MASS-SPECTROMETRY (SIMS) FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE, 1983, 314 (03): : 293 - 299
- [6] A COMPARISON OF SECONDARY ION MASS-SPECTROMETRY AND AUGER-ELECTRON SPECTROSCOPY AS SURFACE ANALYTICAL TECHNIQUES NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3): : 401 - 408
- [7] SURFACE, IN-DEPTH, AND QUANTITATIVE-ANALYSIS BY SECONDARY ION MASS-SPECTROMETRY (SIMS) JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 297 - 297
- [8] SURFACE ANALYTICAL STUDIES USING ION SCATTERING SPECTROMETRY, AUGER-ELECTRON SPECTROSCOPY AND SECONDARY ION MASS-SPECTROMETRY JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 352 - 353
- [9] APPLICATIONS OF AUGER-ELECTRON SPECTROSCOPY AND SECONDARY ION MASS-SPECTROMETRY TO LASER IMPLANTED BORON IN SILICON SCANNING ELECTRON MICROSCOPY, 1983, : 1147 - 1156