DAMAGE AND LATTICE LOCATION STUDIES IN HIGH-TEMPERATURE ION-IMPLANTED DIAMOND

被引：42
|
作者：
BRAUNSTEIN, G [1 ]
KALISH, R [1 ]
机构：
[1] TECHNION ISRAEL INST TECHNOL,DEPT PHYS,HAIFA,ISRAEL
来源：
APPLIED PHYSICS LETTERS | 1981年 / 38卷 / 06期
关键词：
D O I：
10.1063/1.92400
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：416 / 418
页数：3
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