NEW HIGH-CURRENT LOW-ENERGY ION-SOURCE

被引：62

作者：

HARA, T

HAMAGAKI, M

SANDA, A

AOYAGI, Y

NAMBA, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583904

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：366 / 368

页数：3

共 6 条

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[2] CW AR+ LASER PUMPED BY AN INTENSE ELECTRON-BEAM [J].

HARA, T ;

SADAMOTO, Y ;

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OHGO, T ;

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (07) :L379-L380

[3]

Langmuir I., 1924, GEN ELECTR REV, V27, P538

[4] ENERGY-DEPENDENCE OF THE ION-INDUCED SPUTTERING YIELDS OF MONATOMIC SOLIDS [J].

MATSUNAMI, N ;

YAMAMURA, Y ;

ITIKAWA, Y ;

ITOH, N ;

KAZUMATA, Y ;

MIYAGAWA, S ;

MORITA, K ;

SHIMIZU, R ;

TAWARA, H .

ATOMIC DATA AND NUCLEAR DATA TABLES, 1984, 31 (01) :1-80

[5] DISCHARGE AND ION EXTRACTION PROPERTIES OF A BEAM-PLASMA ION-SOURCE [J].

ROSING, MG ;

CONRAD, JR .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (03) :816-818

[6]

Uramoto J., 1977, Journal of the Vacuum Society of Japan, V20, P170, DOI 10.3131/jvsj.20.170

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