LOCAL-STRUCTURE DETERMINATION FOR SURFACE CHLORINATION WITH EELFS

被引：3

作者：

ANDRYUSHECHKIN, BV

ELTSOV, KN

SHEVLYUGA, VM

机构：

[1] Chemical Laboratory, General Physics Institute Russian Academy of Sciences, 117942 Moscow

来源：

PHYSICA B | 1995年 / 208卷 / 1-4期

关键词：

D O I：

10.1016/0921-4526(94)00725-B

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

In this paper the results of an investigation of the local structure of a layer of molecular chlorine condensed on Si(100) at T = 110 K and an unbroken AgCl film evaporated on Ag(111) at T = 160 K are presented. It was found that the nearest neighbor Cl-Ag distance in the AgCl film of 2.75 +/- 0.05 Angstrom is in good agreement with bulk values (2.77 Angstrom). The Cl-Cl distance of 2.00 +/- 0.05 Angstrom in a chlorine film condensed on Si(100) is also close to the bulk value (1.98 Angstrom).

引用

页码：471 / 473

页数：3

共 9 条

[1] LOCAL-STRUCTURE OF A COPPER SURFACE CHLORINATED AT A LOW-TEMPERATURE [J].