INVESTIGATIONS AND MODELING OF E--BEAM EVAPORATED NIO(OH)X FILMS

被引:36
作者
NEMETZ, A
TEMMINK, A
BANGE, K
DETORRESI, SC
GABRIELLI, C
TORRESI, R
HUGOTLEGOFF, A
机构
[1] SCHOTT GLASWERKE,RES & DEV,OTTO SCHOTT STR 2,W-6500 MAINZ 1,GERMANY
[2] UNIV PARIS 06,CNRS,PHYS LIQUIDES & ELECTROCHIM LAB,F-75252 PARIS 05,FRANCE
关键词
D O I
10.1016/0927-0248(92)90019-L
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
NiO(OH)x films deposited by e--beam evaporation have been investigated by means of current voltage graphs (CVG), reflectance voltage graphs (RVG), quartz crystal microbalance (QCM) and fast Fourier-transform infrared spectroscopy (FTIR). Based on these results a new model is developed which supports H+ ejection as well as OH- injection during the coloration process and solves a virtual contradiction of other experimental findings on reactively evaporated NiO(OH)x films.
引用
收藏
页码:93 / 103
页数:11
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