FORMATION OF METASTABLE SUPERSATURATED SOLID-SOLUTIONS IN ION-IMPLANTED SILICON DURING SOLID-PHASE CRYSTALLIZATION

被引:49
作者
NARAYAN, J
HOLLAND, OW
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10.1063/1.93480
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O59 [应用物理学];
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页码:239 / 242
页数:4
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共 10 条
[1]  
Baker J.C., 1971, SOLIDIFICATION, P23
[2]   INCORPORATION OF IMPLANTED IN AND SB IN SILICON DURING AMORPHOUS LAYER REGROWTH [J].
BLOOD, P ;
BROWN, WL ;
MILLER, GL .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (01) :173-182
[3]  
CAHN JW, 1980, LASER ELECTRON BEAM, P89
[4]   SUBSTRATE-ORIENTATION DEPENDENCE OF EPITAXIAL REGROWTH RATE FROM SI-IMPLANTED AMORPHOUS SIA [J].
CSEPREGI, L ;
KENNEDY, EF ;
MAYER, JW ;
SIGMON, TW .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) :3906-3911
[5]   TRANSITION-TEMPERATURES AND HEATS OF CRYSTALLIZATION OF AMORPHOUS GE,SI, AND GE1-XSIX ALLOYS DETERMINED BY SCANNING CALORIMETRY [J].
FAN, JCC ;
ANDERSON, CH .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (06) :4003-4006
[6]  
NARAYAN J, UNPUB
[7]   DIRECT OBSERVATION OF LASER-INDUCED SOLID-PHASE EPITAXIAL CRYSTALLIZATION BY TIME-RESOLVED OPTICAL REFLECTIVITY [J].
OLSON, GL ;
KOKOROWSKI, SA ;
MCFARLANE, RA ;
HESS, LD .
APPLIED PHYSICS LETTERS, 1980, 37 (11) :1019-1021
[8]   CONFIGURATIONAL ENTROPY OF AMORPHOUS SI AND GE [J].
SPAEPEN, F .
PHILOSOPHICAL MAGAZINE, 1974, 30 (02) :417-422
[9]   SOLID SOLUBILITIES OF IMPURITY ELEMENTS IN GERMANIUM AND SILICON [J].
TRUMBORE, FA .
BELL SYSTEM TECHNICAL JOURNAL, 1960, 39 (01) :205-233
[10]  
WILLIAMS JS, APPL PHYS LETT