CHEMICAL VAPOR-DEPOSITION OF FLUORIDE TUNGSTEN MEASUREMENTS AND THERMODYNAMIC CALCULATIONS

被引：0
|
作者：
WAHL, G [1 ]
BATZIES, P [1 ]
机构：
[1] BROWN BOVERI & CIE AG, CENT RES LAB, MANNHEIM, WEST GERMANY
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C249 / C249
页数：1
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