CHEMICAL VAPOR-DEPOSITION OF FLUORIDE TUNGSTEN MEASUREMENTS AND THERMODYNAMIC CALCULATIONS

被引：0

作者：

WAHL, G ^{[1
]}

BATZIES, P ^{[1
]}

机构：

[1] BROWN BOVERI & CIE AG, CENT RES LAB, MANNHEIM, WEST GERMANY

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C249 / C249

页数：1

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