CHEMICAL VAPOR-DEPOSITION OF FLUORIDE TUNGSTEN MEASUREMENTS AND THERMODYNAMIC CALCULATIONS

被引：0

|

作者：

WAHL, G ^{[1
]}

BATZIES, P ^{[1
]}

机构：

[1] BROWN BOVERI & CIE AG, CENT RES LAB, MANNHEIM, WEST GERMANY

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：C249 / C249

页数：1

相关论文

共 50 条

[21] REACTOR DESIGN FOR CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN CARBIDE COATINGS
GARG, D
KELLY, CM
SURFACE & COATINGS TECHNOLOGY, 1992, 54 (1-3): : 198 - 203
[22] LOW-PRESSURE SELECTIVE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN
GREEN, ML
LEVY, RA
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (08) : C313 - C313
[23] LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FROM TUNGSTEN HEXACARBONYL
VOGT, GJ
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04): : 1336 - 1340
[24] SELECTIVE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN
BROADBENT, EK
RAMILLER, CL
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C101 - C101
[25] CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN LAYERS AT LOW SUBSTRATE TEMPERATURES
SHAPOVAL, SY
BALVINSKII, OE
MALIKOV, IV
CHUMAKOV, AA
NISELSON, LA
APPLIED SURFACE SCIENCE, 1990, 45 (03) : 257 - 262
[26] SELECTIVITY LOSS DURING TUNGSTEN CHEMICAL VAPOR-DEPOSITION - THE ROLE OF TUNGSTEN PENTAFLUORIDE
CREIGHTON, JR
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 621 - 624
[27] CHEMICAL VAPOR-DEPOSITION
HIROSE, M
SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 109 - 122
[28] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 5 - IAEC
[29] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
ADVANCES IN CHEMISTRY SERIES, 1989, (221): : 199 - 263
[30] CHEMICAL VAPOR-DEPOSITION
ARCHER, NJ
PHYSICS IN TECHNOLOGY, 1979, 10 (04): : 152 - 161

← 1 2 3 4 5 →