GAAS MIS STRUCTURES WITH SIO2 USING A THIN SILICON INTERLAYER

被引:72
作者
FOUNTAIN, GG
HATTANGADY, SV
VITKAVAGE, DJ
RUDDER, RA
MARKUNAS, RJ
机构
[1] Research Triangle Inst, Research, Triangle Park, NC, USA, Research Triangle Inst, Research Triangle Park, NC, USA
关键词
D O I
10.1049/el:19880771
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
SEMICONDUCTOR DEVICES, MIS
引用
收藏
页码:1134 / 1135
页数:2
相关论文
共 11 条
[1]   INVESTIGATION OF HETEROJUNCTIONS FOR MIS DEVICES WITH OXYGEN-DOPED ALXGA1-XAS ON N-TYPE GAAS [J].
CASEY, HC ;
CHO, AY ;
LANG, DV ;
NICOLLIAN, EH ;
FOY, PW .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) :3484-3491
[2]   LOW INTERFACE STATE DENSITY SIO2 DEPOSITED AT 300-DEGREES-C BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION ON RECONSTRUCTED SI SURFACES [J].
FOUNTAIN, GG ;
RUDDER, RA ;
HATTANGADY, SV ;
MARKUNAS, RJ ;
LINDORME, PS .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (09) :4744-4746
[3]   ELECTRICAL AND MICROSTRUCTURAL CHARACTERIZATION OF AN ULTRATHIN SILICON INTERLAYER USED IN A SILICON DIOXIDE GERMANIUM-BASED MIS STRUCTURE [J].
FOUNTAIN, GG ;
RUDDER, RA ;
HATTANGADY, SV ;
VITKAVAGE, DJ ;
MARKUNAS, RJ ;
POSTHILL, JB .
ELECTRONICS LETTERS, 1988, 24 (16) :1010-1011
[4]   PASSIVATION AND INTERFACE STATE STUDIES ON N-GAAS [J].
FRESE, KW ;
MORRISON, SR .
APPLIED SURFACE SCIENCE, 1981, 8 (03) :266-277
[5]  
HATTANGADY SV, 1987, MATERIALS RES SOC S, V102, P319
[6]   PROPERTIES OF GAAS-AL2O3 AND INP-AL2O3 INTERFACES AND THE FABRICATION OF MIS FIELD-EFFECT TRANSISTORS [J].
KAMIMURA, K ;
SAKAI, Y .
THIN SOLID FILMS, 1979, 56 (1-2) :215-223
[7]   ELECTRICAL-PROPERTIES OF GALLIUM ARSENIDE-INSULATOR INTERFACE [J].
MEINERS, LG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1402-1407
[8]   STUDY OF N-GAAS MOS DIODES WITH SPIN-ON SIO2 LAYER [J].
SENGUPTA, D ;
KUMAR, V .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1982, 73 (02) :K279-K282
[9]   EFFECT OF NATIVE OXIDE ON INTERFACE PROPERTY OF GAAS MIS STRUCTURES [J].
SUZUKI, N ;
HARIU, T ;
SHIBATA, Y .
APPLIED PHYSICS LETTERS, 1978, 33 (08) :761-762