INFLUENCE OF SUBSTRATE MISORIENTATION ON CURRENT GAIN IN ALGAAS/GAAS HETEROJUNCTION BIPOLAR-TRANSISTORS GROWN BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION

被引:1
|
作者
ITO, H
WATANABE, N
NITTONO, T
FURUTA, T
ISHIBASHI, T
机构
[1] NTT LSI Laboratories, Atsugi-shi, Kanagawa, 243-01
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1994年 / 33卷 / 7A期
关键词
GAAS; MOCVD; MISORIENTED SUBSTRATE; DOPING CHARACTERISTICS; MINORITY CARRIER LIFETIME; CURRENT GAIN; HBT;
D O I
10.1143/JJAP.33.3853
中图分类号
O59 [应用物理学];
学科分类号
摘要
The influence of substrate misorientation on the current gain characteristics of AlGaAs/GaAs heterojunction bipolar transistors (HBTs) is systematically investigated. The current gain is found to increase by a factor of up to three when the substrate is tilted from (100). The behavior of the minority electron lifetime determined separately in thick C-doped GaAs layers grown on the same set of misoriented substrates correlates very well with that of the current gain. This is consistent with the result of base current ideality factors, which are close to unity for all devices. These improvements in the current gain and the minority electron lifetime are commonly observed in layers grown on misoriented substrates regardless of the substrate misorientation direction. These results can be interpreted in terms of the incorporation of nonradiative recombination centers such as native defects, where the substrate misorientation can effectively supress the formation of these centers.
引用
收藏
页码:3853 / 3859
页数:7
相关论文
共 50 条
  • [11] The influence of As and Ga prelayers on the metal-organic chemical vapor deposition of GaAs/Ge
    Tyagi, R
    Singh, M
    Thirumavalavan, M
    Srinivasan, T
    Agarwal, SK
    JOURNAL OF ELECTRONIC MATERIALS, 2002, 31 (03) : 234 - 237
  • [12] The influence of As and Ga prelayers on the metal-organic chemical vapor deposition of GaAs/Ge
    R. Tyagi
    M. Singh
    M. Thirumavalavan
    T. Srinivasan
    S. K. Agarwal
    Journal of Electronic Materials, 2002, 31 : 234 - 237
  • [13] CHARACTERIZATION OF HIGH-QUALITY INGAP/GAAS AND INGAASP/GAAS HETEROSTRUCTURES GROWN BY LOW-PRESSURE METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION
    CALDIRONI, M
    VITALI, L
    DELLAGIOVANNA, M
    DIPAOLA, A
    VIDIMARI, F
    PELLEGRINO, S
    FERRARI, C
    FRANZOSI, P
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1994, 28 (1-3): : 158 - 163
  • [14] Characterization of InP/InGaAs heterojunction bipolar transistors with carbon-doped base layers grown by metal-organic chemical vapor deposition and molecular beam epitaxy
    Kuroda, N
    Fujihara, A
    Ikenaga, Y
    Ishizaki, H
    Tanaka, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (9A): : 6412 - 6416
  • [15] PHOTOREFLECTANCE STUDY OF INP AND GAAS BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION USING TERTIARYBUTYLPHOSPHINE AND TERTIARYBUTYLARSINE SOURCES
    KUAN, H
    SU, YK
    CHANG, SJ
    TZOU, WJ
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (4A): : 1831 - 1832
  • [16] IN-SITU SPECTRUM OBSERVATION OF GA DEPOSITION PROCESS DURING GAAS METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION USING SURFACE PHOTOABSORPTION
    YAMAUCHI, Y
    UWAI, K
    KOBAYASHI, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (10A): : L1380 - L1382
  • [17] INP/INGAAS HETEROSTRUCTURE BIPOLAR-TRANSISTORS GROWN AT LOW-TEMPERATURE BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    KURISHIMA, K
    MAKIMOTO, T
    KOBAYASHI, T
    ISHIBASHI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (2B): : L258 - L261
  • [18] Photoluminescence of InGaAsN/GaAs single quantum well grown by metal-organic chemical vapor deposition
    Lai, CT
    Yang, YL
    Wu, BR
    Huang, JH
    Jan, GJ
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2003, 42 : S746 - S749
  • [19] HIGH-CURRENT GAIN ALGAAS/GAAS HETEROJUNCTION BIPOLAR-TRANSISTORS WITH CARBON-DOPED BASE GROWN BY GAS SOURCE MOLECULAR-BEAM EPITAXY USING TRIMETHYLAMINE ALANE AS THE ALUMINUM SOURCE
    YAMAURA, S
    ANDO, H
    OKAMOTO, N
    SANDHU, A
    TAKAHASHI, T
    FUJII, T
    YOKOYAMA, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1993, 32 (3A): : L309 - L311
  • [20] GAAS/GE HETEROJUNCTION GROWN BY METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION AND ITS APPLICATION TO HIGH-EFFICIENCY PHOTOVOLTAIC DEVICES
    CHEN, JC
    RISTOW, ML
    CUBBAGE, JI
    WERTHEN, JG
    JOURNAL OF ELECTRONIC MATERIALS, 1992, 21 (03) : 347 - 353