A STUDY OF THE MORPHOLOGY OF TITANIUM SILICIDE FILMS AND THE TITANIUM SILICIDE-SILICON INTERFACE

被引：2
|
作者：
DELANEROLLE, N
MOSER, L
HOFFMAN, D
MA, D
STERNER, D
机构：
来源：
RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING | 1989年 / 146卷
关键词：
D O I：
10.1557/PROC-146-273
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：273 / 280
页数：8
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