EPITAXIAL GROWTH OF SNO2 ON RUTILE SINGLE CRYSTALS

被引：20

作者：

CASLAVSKA, V

ROY, R

机构：

[1] Materials Research Laboratory, Pennsylvania State University, University Park

来源：

JOURNAL OF APPLIED PHYSICS | 1969年 / 40卷 / 08期

关键词：

D O I：

10.1063/1.1658208

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

[No abstract available]

引用

页码：3414 / +

页数：1

共 9 条

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[4]

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[7] VAPOR REACTION GROWTH OF SNO2 SINGLE CRYSTALS AND THEIR PROPERTIES [J].

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JAPANESE JOURNAL OF APPLIED PHYSICS, 1965, 4 (03) :195-+

[8]

POWELL C, 1966, VAPOR DEPOSITION, P398

[9] VAPOR GROWTH OF TIN OXIDE CRYSTALS [J].

REED, TB ;

RODDY, JT ;

MARIANO, AN .

JOURNAL OF APPLIED PHYSICS, 1962, 33 (03) :1014-&

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