THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .2. EFFECTS OF SIO COATING ON PB-IN-AU BASE ELECTRODE

被引：12
作者：
MURAKAMI, M
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 03期
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D O I：
10.1063/1.329758
中图分类号：
O59 [应用物理学];
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页码：1320 / 1327
页数：8
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共 17 条
[1]   DIFFUSION CREEP OF A THIN FOIL [J].
GIBBS, GB .
PHILOSOPHICAL MAGAZINE, 1966, 13 (123) :589-&
[2]  
GRAY DE, 1972, AM I PHYSICS HDB
[3]   FABRICATION PROCESS FOR JOSEPHSON INTEGRATED-CIRCUITS [J].
GREINER, JH ;
KIRCHER, CJ ;
KLEPNER, SP ;
LAHIRI, SK ;
WARNECKE, AJ ;
BASAVAIAH, S ;
YEN, ET ;
BAKER, JM ;
BROSIOUS, PR ;
HUANG, HCW ;
MURAKAMI, M ;
AMES, I .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :195-205
[4]   DIFFUSIONAL VISCOSITY OF A POLYCRYSTALLINE SOLID [J].
HERRING, C .
JOURNAL OF APPLIED PHYSICS, 1950, 21 (05) :437-445
[5]   STRESS IN FILMS OF SILICON MONOXIDE [J].
HILL, AE ;
HOFFMAN, GR .
BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (01) :13-&
[6]   HIGH-RELIABILITY PB-ALLOY JOSEPHSON-JUNCTIONS FOR INTEGRATED-CIRCUITS [J].
HUANG, HCW ;
BASAVAIAH, S ;
KIRCHER, CJ ;
HARRIS, EP ;
MURAKAMI, M ;
KLEPNER, SP ;
GREINER, JH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (10) :1979-1987
[7]  
KUAN TS, 1980, RC8459 IBM RES REP
[8]  
MEHRER H, 1972, CRYSTAL LATTICE DEFE, V3, P1
[9]   RESIDUAL STRAINS OF PB THIN-FILMS DEPOSITED ONTO SI SUBSTRATES [J].
MURAKAMI, M .
ACTA METALLURGICA, 1978, 26 (01) :175-183
[10]   THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .1. EFFECTS OF FILM THICKNESS AND GRAIN-SIZE OF PB-IN-AU BASE ELECTRODES [J].
MURAKAMI, M .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) :1309-1319
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