INTERNAL-FRICTION AND ITS THERMAL EVOLUTION MEASURED ON VERY THIN PLATINUM FILMS

被引：8
|
作者：
PELOSIN, V
BADAWI, KF
BRANGER, V
机构：
[1] Laboratoire de Métallurgie Physique, URA 131 du CNRS, Université de Poitiers, 86022 Poitiers cedex
来源：
APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 06期
关键词：
D O I：
10.1063/1.114101
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Internal friction has been measured between 300 and 800 K on thin platinum films using a vibrating reed device. The 575 and 1500 Å thick samples were deposited with ion assistance on silicon substrate. It has been shown that the damping level is considerably reduced by annealing between 650 and 800 K. Thanks to isothermal experiments, we have determined the activation enthalpy of the process involved in the present structural evolution. The calculated energies and complementary transmission electron microscopy micrographs let us assume that the observed mechanism is closely related to microstructural rearrangements located at grain boundaries. © 1995 American Institute of Physics.
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页码：691 / 693
页数：3
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