Structural and optical properties of nanocrystalline alpha-MoO3 thin films prepared at different annealing temperatures

被引：50
作者：
Hojabri, A. [1 ]
Hajakbari, F. [1 ]
Meibodi, A. Emami [1 ]
机构：
[1] Islamic Azad Univ, Karaj Branch, Dept Phys, Karaj, Iran
来源：
JOURNAL OF THEORETICAL AND APPLIED PHYSICS | 2015年 / 9卷 / 01期
关键词：
MoO3; Thin film; Layered structure; Annealing temperature; Nanocrystalline;
D O I：
10.1007/s40094-014-0161-5
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Nanocrystalline alpha-MoO3 thin films were prepared successfully by thermal annealing of molybdenum (Mo) thin films deposited on quartz and silicon substrates using DC magnetron sputtering method. The influence of annealing temperatures ranging from 400 to 1,000 degrees C on the structural, morphological and optical properties of the prepared films was investigated by X-ray diffraction, Fourier transform infrared spectrophotometer (FTIR) atomic force microscopic and UV-vis spectroscopy, respectively. The results show that the crystallinity and surface morphology of the films are strongly dependent on the annealing temperature. Also, the optimum annealing temperature of Mo films in our experiment was 600 degrees C and the films formed at this temperature exhibit only the (0k0) reflections and indicated the layered structure of alpha-MoO3. The FTIR spectra confirm the formation of MoO3. The transmittance of the MoO3 films on quartz substrate was improved with increasing annealing temperature.
引用
收藏
页码：67 / 73
页数：7
相关论文
共 17 条
[1]   Optical constants and thermocoloration of pulsed laser deposited molybdenum oxide thin films [J].
Al-Kuhaili, M. F. ;
Durrani, S. M. A. ;
Bakhtiari, I. A. ;
Al-Shukri, A. M. .
OPTICS COMMUNICATIONS, 2010, 283 (14) :2857-2862
[2]   Flow rate effect on the structure and morphology of molybdenum oxide nanoparticles deposited by atmospheric-pressure microplasma processing [J].
Bose, Arumugam Chandra ;
Shimizu, Yoshiki ;
Mariotti, Davide ;
Sasaki, Takeshi ;
Terashima, Kazuo ;
Koshizaki, Naoto .
NANOTECHNOLOGY, 2006, 17 (24) :5976-5982
[3]   Effect of substrate temperature on the structural and optical properties of MoO3 thin films prepared by spray pyrolysis technique [J].
Bouzidi, A ;
Benramdane, N ;
Tabet-Derranz, H ;
Mathieu, C ;
Khelifa, B ;
Desfeux, R .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 97 (01) :5-8
[4]   Structural and optical properties of copper nitride thin films in a reactive Ar/N2 magnetron sputtering system [J].
Dorranian, D. ;
Dejam, L. ;
Sari, A. H. ;
Hojabri, A. .
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2010, 50 (02) :205031-205037
[5]   Development of MoOx thin films as back contact buffer for CdTe solar cells in substrate configuration [J].
Gretener, C. ;
Perrenoud, J. ;
Kranz, L. ;
Baechler, C. ;
Yoon, S. ;
Romanyuk, Y. E. ;
Buecheler, S. ;
Tiwari, A. N. .
THIN SOLID FILMS, 2013, 535 :193-197
[6]   Structural, electrical, and decorative properties of sputtered zirconium thin films during post-annealing process [J].
Khojier, Kaykhosrow ;
Savaloni, Hadi ;
Jafari, Fatemeh .
JOURNAL OF THEORETICAL AND APPLIED PHYSICS, 2013, 7 (01)
[7]   Physical properties of sputtered molybdenum oxide thin films suitable for gas sensing applications [J].
Manno, D ;
Di Giulio, M ;
Serra, A ;
Siciliano, T ;
Micocci, G .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 35 (03) :228-233
[8]   Effect of annealing on the structural and optical properties of InSe bilayer thin films [J].
Matheswaran, P. ;
Kumar, R. Saravana ;
Sathyamoorthy, R. .
VACUUM, 2011, 85 (08) :820-826
[9]   Growth and characterization of molybdenum oxide nanorods by RF magnetron sputtering and subsequent annealing [J].
Navas, I. ;
Vinodkumar, R. ;
Lethy, K. J. ;
Detty, A. P. ;
Ganesan, V. ;
Sathe, V. ;
Pillai, V. P. Mahadevan .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (17)
[10]   Influence of sputtering power on the physical properties of magnetron sputtered molybdenum oxide films [J].
Nirupama, V. ;
Uthanna, S. .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2010, 21 (01) :45-52
12