KINETICS OF OXYGEN DISSOCIATION ON SI(111)7X7 INVESTIGATED WITH OPTICAL 2ND-HARMONIC GENERATION

被引:47
作者
BRATU, P
KOMPA, KL
HOFER, U
机构
[1] Max-Planck-Institut für Quantenoptik
来源
PHYSICAL REVIEW B | 1994年 / 49卷 / 19期
关键词
D O I
10.1103/PhysRevB.49.14070
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Optical second-harmonic generation is used as a sensitive, nondestructive probe for the thermally activated dissociation of molecular oxygen on Si(111)7 x 7. Isothermal measurements show that the dissociation kinetics strongly depend on the total oxygen coverage. At room temperature the 1/e lifetime of chemisorbed O2 is approximately 15 min for saturation coverage but approximately 50 min for low oxygen coverage. The temperature dependence of the dissociation rates between 80 and 500 K indicates that more than one dissociation channel and/or molecular oxygen species exist on the surface.
引用
收藏
页码:14070 / 14073
页数:4
相关论文
共 28 条
[1]   ATOM-RESOLVED SURFACE-CHEMISTRY - THE EARLY STEPS OF SI(111)-7X7 OXIDATION [J].
AVOURIS, P ;
LYO, IW ;
BOZSO, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02) :424-430
[2]  
AVOURIS P, 1992, AIP CONF PROC, V241, P283
[3]   THERMAL AND PHOTOCHEMICAL OXIDATION OF SI(111) - DOPING EFFECT AND THE REACTION-MECHANISM [J].
BOZSO, F ;
AVOURIS, P .
PHYSICAL REVIEW B, 1991, 44 (16) :9129-9132
[4]   OXIDATION OF THE SI(111) (7X7) SURFACE - ELECTRON-ENERGY LOSS SPECTROSCOPY, LOW-ENERGY ELECTRON-DIFFRACTION, AND AUGER-ELECTRON SPECTROSCOPY STUDIES [J].
EDAMOTO, K ;
KUBOTA, Y ;
KOBAYASHI, H ;
ONCHI, M ;
NISHIJIMA, M .
JOURNAL OF CHEMICAL PHYSICS, 1985, 83 (01) :428-436
[5]  
ENGEL T, 1993, SURF SCI REP, V18, P91, DOI 10.1016/0167-5729(93)90016-I
[6]   OXIDATION-KINETICS OF SI(111) 7X7 IN THE SUBMONOLAYER REGIME [J].
GUPTA, P ;
MAK, CH ;
COON, PA ;
GEORGE, SM .
PHYSICAL REVIEW B, 1989, 40 (11) :7739-7749
[7]  
HALL RB, 1990, CHEM PHYSICS SOLID S, V8, P87
[8]  
Heinz T. F., 1991, NONLINEAR SURFACE EL, P353
[9]   STUDY OF SYMMETRY AND DISORDERING OF SI(111)-7X7 SURFACES BY OPTICAL 2ND HARMONIC-GENERATION [J].
HEINZ, TF ;
LOY, MMT ;
THOMPSON, WA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (05) :1467-1470
[10]   ADSORPTION OF MOLECULAR-OXYGEN ON SI(111) [J].
HOFER, U ;
PUSCHMANN, A ;
COULMAN, D ;
UMBACH, E .
SURFACE SCIENCE, 1989, 211 (1-3) :948-958