MICROSTRUCTURAL DEVELOPMENT IN THE NEAR-SURFACE REGION DURING THERMAL ANNEALING OF AL2O3 IMPLANTED WITH CATIONIC IMPURITIES

被引：30
作者：
FARLOW, GC
SKLAD, PS
WHITE, CW
MCHARGUE, CJ
机构：
[1] OAK RIDGE NATL LAB,DIV MET & CERAM,OAK RIDGE,TN 37831
[2] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37831
来源：
JOURNAL OF MATERIALS RESEARCH | 1990年 / 5卷 / 07期
基金：
美国能源部;
关键词：
D O I：
10.1557/JMR.1990.1502
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Single-crystal A12O3 was implanted with cationic impurities in the dose range 1−4 × 1016/cm2 and subsequently annealed in either an oxidizing or reducing environment. Following annealing at 1200 °C or higher, crystalline precipitates or solid solutions are observed, which are consistent with what is expected from the equilibrium phase diagram. © 1990, Materials Research Society. All rights reserved.
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页码：1502 / 1519
页数：18
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