ELECTRON-MICROPROBE STUDY OF FIELD-ASSISTED BONDING OF GLASSES TO METALS

被引：45

作者：

BOROM, MP ^{[1
]}

机构：

[1] GE, RES & DEV CTR, MET & CERAMICS LAB, CERAMICS BRANCH, SCHENECTADY, NY 12301 USA

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1973年 / 56卷 / 05期

关键词：

D O I：

10.1111/j.1151-2916.1973.tb12482.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：254 / 257

页数：4

共 17 条

[1]

BOROM MP, 1967, PHYS CHEM GLASSES, V8, P194

[2] ROLE OF ADHERENCE OXIDES IN DEVELOPMENT OF CHEMICAL BONDING AT GLASS-METAL INTERFACES [J].

BOROM, MP ;

PASK, JA .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1966, 49 (01) :1-&

[3] REACTIONS BETWEEN METALLIC IRON AND COBALT OXIDE-BEARING SODIUM DISILICATE GLASS [J].

BOROM, MP ;

LONGWELL, JA ;

PASK, JA .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1967, 50 (02) :61-&

[4] LOCAL COMPOSITIONAL CHANGES IN ALKALI SILICATE GLASSES DURING ELECTRON MICROPROBE ANALYSIS [J].

BOROM, MP ;

HANNEMAN, RE .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (05) :2406-&

[5] KINETICS OF DISSOLUTION AND DIFFUSION OF OXIDES OF IRON IN SODIUM DISILICATE GLASS [J].

BOROM, MP ;

PASK, JA .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1968, 51 (09) :490-&

[6]

Cobine J.D., 1958, GASEOUS CONDUCTORS

[7] LOW ENERGY METAL-GLASS BONDING [J].

DENEE, PB .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (13) :5396-&

[8] ELECTROLYSIS OF SIO2 ON SILICON [J].

JORGENSE.PJ .

JOURNAL OF CHEMICAL PHYSICS, 1968, 49 (04) :1594-+

[9] EFFECT OF AN ELECTRIC FIELD ON SILICON OXIDATION [J].

JORGENSEN .

JOURNAL OF CHEMICAL PHYSICS, 1962, 37 (04) :874-&

[10] EFFECT OF AN ELECTRIC FIELD ON THE OXIDATION OF ZINC [J].

JORGENSEN, PJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (05) :461-462

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