PLASMA ANODIZATION OF METALS AND SEMICONDUCTORS

被引：46

作者：

OHANLON, JF

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1970年 / 7卷 / 02期

关键词：

D O I：

10.1116/1.1315852

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：330 / &

共 42 条

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