HIGH-TC THIN-FILMS AND THEIR APPLICATIONS

被引：0

作者：

HABERMEIER, HU

机构：

来源：

EUROPEAN JOURNAL OF SOLID STATE AND INORGANIC CHEMISTRY | 1991年 / 28卷

关键词：

EVAPORATION; DEPOSITION;

D O I：

暂无

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

A successful implementation of high temperature superconducting materials in a future device technology depends strongly on requirements of a precision thin film technology. To accomplish this goal, different in-situ preparation schemes have been developed based on well known multicomponent thin film deposition techniques like coevaporation, cosputtering, ion beam deposition and pulsed laser deposition. In this review the potential of the pulsed laser deposition technique is analyzed with respect to expitaxial growth of films and surface quality. Some problems associated with the use of high T(c) materials in passive and active devices are commented.

引用

页码：619 / 626

页数：8

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