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- [3] SPIRAL HOLLOW-CATHODE PLASMA-ASSISTED DIAMOND DEPOSITIONAPPLIED PHYSICS LETTERS, 1988, 53 (23) : 2326 - 2327TZENG, YKUNG, PJZEE, RLEGG, KSOLNICKLEGG, HBURNS, DLOO, BH
- [4] GROWTH OF DIAMOND THIN-FILMS BY ELECTRON ASSISTED CHEMICAL VAPOR-DEPOSITIONAPPLIED PHYSICS LETTERS, 1985, 46 (02) : 146 - 147SAWABE, AINUZUKA, T
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- [6] GROWTH OF DIAMOND BY RF PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITIONJOURNAL OF MATERIALS RESEARCH, 1988, 3 (06) : 1397 - 1403MEYER, DEIANNO, NJWOOLLAM, JASWARTZLANDER, ABNELSON, AJ
- [7] GROWTH OF DIAMOND THIN-FILMS BY DC PLASMA CHEMICAL VAPOR-DEPOSITION AND CHARACTERISTICS OF THE PLASMAJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (01): : 153 - 157SUZUKI, KSAWABE, AINUZUKA, T
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- [9] SELECTIVE NUCLEATION AND GROWTH OF DIAMOND PARTICLES BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITIONAPPLIED PHYSICS LETTERS, 1989, 55 (11) : 1071 - 1073MA, JSKAWARADA, HYONEHARA, TSUZUKI, JWEI, JYOKOTA, YHIRAKI, A
- [10] MICROSTRUCTURES OF DIAMOND FORMED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITIONJOURNAL OF MATERIALS RESEARCH, 1990, 5 (07) : 1480 - 1489KAAE, JLGANTZEL, PKCHIN, JWEST, WP