GETTER SPUTTERING - REVIEW

被引：8

作者：

HOLLAND, L

COX, REL

机构：

[1] BRUNEL UNIV,PHYS DEPT,UXBRIDGE,ENGLAND

[2] EDWARDS HIGH VACUUM INT,CRAWLEY,SUSSEX,ENGLAND

来源：

关键词：

D O I：

10.1016/0042-207X(74)92453-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：107 / 116

页数：10

共 29 条

[1]

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[2]

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[3]

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[4]

BERGHAUS B, 1939, Patent No. 505799

[5]

BERHAUS B, 1943, Patent No. 736130

[6]

COOK HC, 1966, T METALL SOC AIME, V236, P314

[7] GAS-ANALYSIS IN AN RF SPUTTERING PLANT [J].

COX, REL ;

HOLLAND, L .

NATURE-PHYSICAL SCIENCE, 1973, 241 (112) :149-150

[8]

DARBYSHIRE JA, 1933, J SCI I, V10, P83

[9] ALUMINUM FILMS DEPOSITED BY RF SPUTTERING [J].

DHEURLE, FM .

METALLURGICAL TRANSACTIONS, 1970, 1 (03) :725-&

FRERICHS, R .