ADVANCES IN SILICON-CARBIDE DEVICE PROCESSING AND SUBSTRATE FABRICATION FOR HIGH-POWER MICROWAVE AND HIGH-TEMPERATURE ELECTRONICS

被引:0
作者
BRANDT, CD
AGARWAL, AK
AUGUSTINE, G
BURK, AA
CLARKE, RC
GLASS, RC
HOBGOOD, HM
MCHUGH, JP
MCMULLIN, PG
SIERGIEJ, RR
SMITH, TJ
SRIRAM, S
DRIVER, MC
HOPKINS, RH
机构
来源
COMPOUND SEMICONDUCTORS 1994 | 1995年 / 141期
关键词
D O I
暂无
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
High power density, temperature and radiation tolerant SiC electronics offer an exceptional opportunity to increase the performance and lower the cost of systems ranging from radar transmitters, to aircraft and tank controls, to missile sensors. Growth and fabrication of 2-inch diameter semi-insulating and low resistivity wafers, MESFETs with 25GHz cutoff frequencies and 2-3X the power density of GaAs devices, the world's first SiC static induction transistor, and 300 degrees C analog and digital MOSFET circuits are among recent technological advances.
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页码:373 / 376
页数:4
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