ANALYSIS OF THE THERMAL CONTRIBUTION TO UV LASER-INDUCED OXIDATION OF SILICON AND SILICON MONOXIDE

被引：9
作者：
FOGARASSY, E
UNAMUNO, S
REGOLINI, JL
FUCHS, C
机构：
来源：
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1987年 / 55卷 / 02期
关键词：
D O I：
10.1080/13642818708211207
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：253 / 260
页数：8
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