A NEW METHOD FOR ENHANCING FOCUS LATITUDE IN OPTICAL LITHOGRAPHY - FLEX

被引:29
作者
FUKUDA, H
HASEGAWA, N
TANAKA, T
HAYASHIDA, T
机构
关键词
D O I
10.1109/EDL.1987.26594
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:179 / 180
页数:2
相关论文
共 3 条
[1]   CHARACTERIZATION OF POSITIVE PHOTORESIST [J].
DILL, FH ;
HORNBERGER, WP ;
HAUGE, PS ;
SHAW, JM .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :445-452
[2]  
Griffing B. F., 1983, ELECTRON DEVICE LETT, V4, P14
[3]   GENERAL SIMULATOR FOR VLSI LITHOGRAPHY AND ETCHING PROCESSES .1. APPLICATION TO PROJECTION LITHOGRAPHY [J].
OLDHAM, WG ;
NANDGAONKAR, SN ;
NEUREUTHER, AR ;
OTOOLE, M .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :717-722