A NEW METHOD FOR ENHANCING FOCUS LATITUDE IN OPTICAL LITHOGRAPHY - FLEX

被引:29
作者
FUKUDA, H
HASEGAWA, N
TANAKA, T
HAYASHIDA, T
机构
关键词
D O I
10.1109/EDL.1987.26594
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:179 / 180
页数:2
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共 3 条
  • [1] CHARACTERIZATION OF POSITIVE PHOTORESIST
    DILL, FH
    HORNBERGER, WP
    HAUGE, PS
    SHAW, JM
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 445 - 452
  • [2] Griffing B. F., 1983, ELECTRON DEVICE LETT, V4, P14
  • [3] GENERAL SIMULATOR FOR VLSI LITHOGRAPHY AND ETCHING PROCESSES .1. APPLICATION TO PROJECTION LITHOGRAPHY
    OLDHAM, WG
    NANDGAONKAR, SN
    NEUREUTHER, AR
    OTOOLE, M
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 717 - 722