UNIFORM ELECTRON-CYCLOTRON RESONANCE PLASMA GENERATION FOR PRECISE ULSI PATTERNING

被引：5

作者：

SAMUKAWA, S ^{[1
]}

NAKAMURA, T ^{[1
]}

ISHIDA, T ^{[1
]}

ISHITANI, A ^{[1
]}

机构：

[1] NEC CORP LTD,MECHATRON RES LAB,MIYAMAE KU,KAWASAKI,KANAGAWA 213,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1992年 / 31卷 / 6B期

关键词：

ECR PLASMA; MAGNETIC FIELD PROFILES; PLASMA INSTABILITY;

D O I：

10.1143/JJAP.31.L774

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Microwave perturbation results in lower microwave absorption because of plasma vibrations and pulses in an electron cyclotron resonance (ECR) plasma. Moreover, the parabolic 875 G equimagnetic field and the nonuniform magnetic field gradient causes nonuniform microwave absorption. Then, magnetohydrodynamic (MHD) plasma instability is generated in the ECR plasma. Accurate control of magnetic field profiles and microwave conditions for uniform and efficient microwave absorption is essential to the achievement of stable ECR plasma generation for precise anisotropic etching.

引用

页码：L774 / L776

页数：3

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