PHOTOLUMINESCENCE STUDY OF SULFIDE LAYERS ON P-TYPE INP

被引:16
作者
LEONELLI, R
SUNDARARAMAN, CS
CURRIE, JF
机构
[1] UNIV MONTREAL,RECH COUCHES MINCES GRP,MONTREAL H3C 3J7,QUEBEC,CANADA
[2] ECOLE POLYTECH,DEPT GENIE PHYS,MONTREAL H3C 3A7,QUEBEC,CANADA
[3] ECOLE POLYTECH,RECH COUCHES MINCES GRP,MONTREAL H3C 3A7,QUEBEC,CANADA
关键词
D O I
10.1063/1.103798
中图分类号
O59 [应用物理学];
学科分类号
摘要
The emission spectra from sulfurized p-InP annealed at temperatures below 300°C are compared with those from untreated samples annealed under the same conditions. The unsulfurized samples show a VP related emission band at 1.14 eV whose intensity increases linearly with annealing temperature. The sulfurized samples exhibit an emission band at 0.94 eV attributed to a S P deep level. Both bands disappear when a layer of 20 Å is chemically removed. This shows that both VP and SP formation is limited to a few atomic surface layers.
引用
收藏
页码:2678 / 2679
页数:2
相关论文
共 11 条
[1]   SULFIDATION OF INP IN H2S VAPOR AND ELECTROCHEMICAL CHARACTERIZATIONS [J].
BARBOUTH, N ;
BERTHIER, Y ;
LINCOT, D ;
LETHOMAS, A .
JOURNAL DE PHYSIQUE, 1988, 49 (09) :1545-1554
[2]   OPTICAL-PROPERTIES OF IN1-XGAXP1-YASY, INP, GAAS, AND GAP DETERMINED BY ELLIPSOMETRY [J].
BURKHARD, H ;
DINGES, HW ;
KUPHAL, E .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) :655-662
[3]   PREPARATION AND ELECTRICAL-PROPERTIES OF INPXOY GATE INSULATORS ON INP [J].
CHANG, HL ;
MEINERS, LG ;
SA, CJ .
APPLIED PHYSICS LETTERS, 1986, 48 (05) :375-377
[4]   SILICON IMPLANTATION IN SEMI-INSULATING BULK INP - ELECTRICAL AND PHOTOLUMINESCENCE MEASUREMENTS [J].
DUHAMEL, N ;
RAO, EVK ;
GAUNEAU, M ;
THIBIERGE, H ;
MIRCEA, A .
JOURNAL OF CRYSTAL GROWTH, 1983, 64 (01) :186-193
[5]   SULFUR AS A SURFACE PASSIVATION FOR INP [J].
IYER, R ;
CHANG, RR ;
LILE, DL .
APPLIED PHYSICS LETTERS, 1988, 53 (02) :134-136
[6]   INTERFACE STUDIES AND ELECTRICAL-PROPERTIES OF PLASMA SULFIDE LAYERS ON N-TYPE INP [J].
KLOPFENSTEIN, P ;
BASTIDE, G ;
ROUZEYRE, M ;
GENDRY, M ;
DURAND, J .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (01) :150-158
[7]   INVESTIGATION OF PROCESS-INDUCED DEFECTS IN INP [J].
RAO, EVK ;
SIBILLE, A ;
DUHAMEL, N .
PHYSICA B & C, 1983, 116 (1-3) :449-455
[8]   DEEP RADIATIVE LEVELS IN AS-GROWN AND IMPLANTED RAPID THERMAL ANNEALED INP [J].
RAO, MV ;
AINA, OA ;
FATHIMULLA, A ;
THOMPSON, PE .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (05) :2426-2433
[9]  
SUNDARARAMAN CS, 1990, SECOND INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, P224, DOI 10.1109/ICIPRM.1990.203022
[10]  
SUNDARARAMAN CS, 1990, 5TH P CAN SEM TECHN