ANODIC FILM STUDIES ON NICKEL UNDER HIGH-RATE TRANS-PASSIVE DISSOLUTION CONDITIONS

被引:29
作者
DATTA, M
MATHIEU, HJ
LANDOLT, D
机构
[1] Materials Department, Swiss Federal Institute of Technology, Lausanne
关键词
D O I
10.1016/0013-4686(79)87007-3
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Coulometry and Auger Electron Spectroscopy (AES) were employed to study thickness and composition of anodic films formed on nickel under high rate transpassive dissolution conditions. Nickel anodes were polarized at constant current densities up to 30 A/cm2 in alkaline nitrate electrolytes of different nitrate and hydroxyl ion concentration using a flow channel cell with a constant electrolyte flow velocity of 10m/sec. Results show that with increasing current density film thickness goes through a maximum. Nitrogen is detected at the apparent film metal interface in the current region where metal dissolution occurs. No correlation between anodic film thickness and dissolution efficiency is found. The data, together with previous observations, suggest that high rate transpassive dissolution takes place from film free sites. © 1979.
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页码:843 / 850
页数:8
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